Silicon oxide vapor phase collection furnace
2025-11-28
Manufacturer: Zhuzhou Nuotian Electric Heating Technology Co., Ltd.
Core Purpose: Adopting high-temperature chemical vapor deposition (CVD) technology to achieve efficient collection and purification of high-purity silica powder. It is suitable for raw material preparation in fields such as semiconductor silicon materials, optical glass raw materials, and high-end ceramic additives.
Project Background
A new material technology company specializes in the R&D and production of semiconductor-grade high-purity silica powder. Its original equipment had problems such as low collection efficiency, substandard product purity, and high energy consumption, which failed to meet the strict standards of the semiconductor industry for silica powder purity (requiring ≥99.999%) and particle size uniformity.
After industry research, the company finally cooperated with Zhuzhou Nuotian Electric Heating Technology Co., Ltd. and customized the NT-QX-2000 Silica Vapor Collection Furnace to upgrade the production process.
